SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 517, Issue 23, 2009, Pages 6287-6289

Optical properties of SnO2:F films deposited by atmospheric pressure CVD

(5) Remes, Zdenek a Vanecek, M a Yates, H M b Evans, P b Sheel, D W c

a INSTITUTE OF PHYSICS (Czech Republic)

b UNIVERSITY OF SALFORD (United Kingdom)

c CVD Technologies Ltd (United Kingdom)

Author keywords

Chemical vapor deposition; Optical properties; Solar cells; Tin oxide

Indexed keywords

ABSORPTANCE; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; ATMOSPHERIC PRESSURE CVD; AVERAGE SURFACE ROUGHNESS; DEFECT CONCENTRATIONS; ELECTRICAL RESISTANCES; ELECTRICAL RESISTIVITY; GAS CONCENTRATION; HIGH INDEX; INCORPORATION RATIO; INDUSTRIAL REQUIREMENTS; LOW COSTS; OPTICAL ABSORPTION; PHOTOTHERMAL DEFLECTIONS; PRECISE METHOD; PROCESS SPEED; SPECTRAL RANGE; SUSCEPTOR TEMPERATURE; TRANSPARENT LIQUIDS;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; COMPOSITE STRUCTURES; DOPING (ADDITIVES); ELECTRIC RESISTANCE; GAS ABSORPTION; LIGHT TRANSMISSION; PHOTOVOLTAIC CELLS; REFRACTIVE INDEX; SOLAR CELLS; SURFACE ROUGHNESS; TIN; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 68449089003 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.02.109 Document Type: Article

Times cited : (84)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.