Depth sensitive fourier-scatterometry for the characterization of sub-100 nm periodic structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8083, Issue , 2011, Pages

  Ferreras Paz, V ^a   Peterhansel S ^a   Frenner, K ^a   Osten, W ^a   Ovsianikov, A ^b   Obata, K ^b   Chichkov, B ^b  

^a UNIVERSITY OF STUTTGART   (Germany)

^b LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

Fourier scatterometry; High resolution metrology; Pupil plane scatterometry; Sensitivity analysis; Two photon polymerization; White light interferometry

Indexed keywords

FOURIER-SCATTEROMETRY; HIGH RESOLUTION METROLOGY; SCATTEROMETRY; TWO-PHOTON-POLYMERIZATION; WHITE-LIGHT INTERFEROMETRY;

CHARACTERIZATION; FOURIER TRANSFORMS; INTERFEROMETRY; LIGHT SENSITIVE MATERIALS; LIGHT SOURCES; PHOTONS; PHOTOREFRACTIVE MATERIALS; PHOTOSENSITIVITY; POLYMERIZATION; POLYMERS; SENSITIVITY ANALYSIS; UNITS OF MEASUREMENT;

PERIODIC STRUCTURES;

EID: 79958061915     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.889439     Document Type: Conference Paper

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