Model-based white light interference microscopy for metrology of transparent film stacks and optically-unresolved structures

Fringe 2009 - 6th International Workshop on Advanced Optical Metrology

Volumn , Issue , 2009, Pages 236-243

  De Groot, Peter ^a   De Lega, Xavier Colonna ^a   Liesener, Jan ^a  

^a ZYGO CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84903938801     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1007/978-3-642-03051-2_40     Document Type: Conference Paper

References (13)

1. de Groot, P (1995) Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms. US Patent No. 5,398,113.
2. Colonna de Lega, X, de Groot, P (2005) Optical Topography Measurement of Patterned Wafers. AIP ULSI Proceedings 788:432
3. de Groot, P, Colonna de Lega, X (2004) Signal modeling for low coherence height-scanning interference microscopy, Appl. Opt., 43:4821
4. Kim, S-W, Kim, G-H (1999) Thickness-profile measurement of transparent thin-film layers by white-light scanning interferometry. Appl. Opt. 38:5968
5. Pluta, M (1993) Advanced light microscopy. Vol.3, Elsevier, Amsterdam: 265
6. Shatalin, S V, Jukaitis, R; Tan J B, Wilson, T (1995) Reflection conoscopy and microellipsometry of isotropic thin film structures. J. Microsc. 179:241
7. Feke, G D, Snow, D P, Grober, R D, de Groot, P, Deck, L (1998) Interferometric back focal plane microellipsometry. Appl. Opt. 37:1796
8. Davidson, M, (2006) Interferometric back focal plane scatterometry with Koehler illumination. US Patent 7,061,623
9. Colonna de Lega, X, de Groot, P (2008) Interferometer for determining characteristics of an object surface, US patent 7,446,882
10. Colonna de Lega, X, Fay, M, de Groot, P, Kamenev, B, Kruse, J R, Haller, M, Davidson, M, Miloslavsky, L, Mills, D (2009) Multi-purpose optical profiler for characterization of materials, film stacks and for absolute topography measurement. SPIE 7272:paper 163
11. Totzeck, M (2001) Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields. Optik 112:381
12. de Groot, P, Colonna de Lega, X, Liesener, J, Darwin, M (2008) Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling. Opt. Express 16:3970
13. Raymond, C J, (2001) Scatterometry for Semiconductor Metrology. Handbook of Silicon Semiconductor Metrology, A. J. Deibold, ed., (Marcel Dekker, Inc., New York)