Fieldstitching with Kirchhoff-boundaries as a model based description for line edge roughness (LER) in scatterometry

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1029-1032

  Schuster, Thomas ^a   Rafler, Stephan ^a   Paz, Valeriano Ferreras ^a   Frenner, Karsten ^a   Osten, Wolfgang ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Fieldstitching; Kirchhoff approximation; Line edge roughness; OCD; Optical scatterometry

Indexed keywords

FIELDSTITCHING; KIRCHHOFF APPROXIMATION; LINE EDGE ROUGHNESS; OCD; OPTICAL SCATTEROMETRY;

HUMAN COMPUTER INTERACTION; PHOTORESISTS;

ROUGHNESS MEASUREMENT;

EID: 67349094265     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.019     Document Type: Article

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