Fabrication of metrology test structures for future technology nodes using high resolution variable-shaped E-Beam direct write

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Szikszai, László ^a   Jaschinsky, Philipp ^a   Keil, Katja ^a   Hauptmann, Marc ^a   Mört, Manfred ^b   Seifert, Uwe ^b   Hohle, Christoph ^b   Choi, Kang Hoon ^b   Thrum, Frank ^b   Kretz, Johannes ^b   Paz, Valeriano Ferreras ^c   Boef, Arie Den ^d  

^a Fraunhofer Center Nanoelectronic Technologies   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^c UNIVERSITY OF STUTTGART   (Germany)

^d ASML   (Netherlands)

Author keywords

CD SEM metrology; Defects; Electron beam direct write; Line edge roughness; Line width roughness; Scatterometry

Indexed keywords

CD-SEM METROLOGY; ELECTRON BEAM DIRECT WRITE; LINE EDGE ROUGHNESS; LINE WIDTH ROUGHNESS; SCATTEROMETRY;

DATA STORAGE EQUIPMENT; DEFECT DENSITY; DEFECTS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; INSTRUMENT TESTING; MEASUREMENTS; PHOTORESISTS; TECHNOLOGY;

ROUGHNESS MEASUREMENT;

EID: 67149084968     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814181     Document Type: Conference Paper

References (9)

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