Fundamental limits of optical critical dimension metrology: A simulation study

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Silver, Richard ^a   Germer, Thomas ^a   Attota, Ravikiran ^a   Barnes, Bryan M ^a   Bunday, Benjamin ^b   Allgair, John ^b   Marx, Egon ^a   Jun, Jay ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

Critical dimension metrology; Noise analysis; Optical critical dimension metrology; Optical metrology; Polarization; Scatterometry

Indexed keywords

NOISE ANALYSIS; OPTICAL CRITICAL DIMENSION SCATTEROMETRY (OCD); OPTICAL METROLOGY;

MATHEMATICAL MODELS; POLARIZATION; PROCESS CONTROL; PROJECT MANAGEMENT; SENSITIVITY ANALYSIS; SPURIOUS SIGNAL NOISE;

OPTICAL VARIABLES MEASUREMENT;

EID: 35148880658     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.716604     Document Type: Conference Paper

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