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Volumn 88, Issue 7, 2011, Pages 1573-1575
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Charge-trapping MOS memory structure using anodic alumina charging medium
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Author keywords
Charge trapping memory; Porous anodic alumina
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Indexed keywords
ANODIC ALUMINA;
CHARGE TRAPPING MEMORIES;
CHARGING/DISCHARGING;
DIELECTRIC LAYER;
GATE DIELECTRIC STACKS;
HIGH-K DIELECTRIC;
LOW COSTS;
MEMORY STRUCTURE;
MEMORY WINDOW;
MOS STRUCTURE;
POROUS ANODIC ALUMINA;
POROUS ANODIC ALUMINUM OXIDES;
TUNNEL OXIDES;
ALUMINUM SHEET;
CHARGE TRAPPING;
DIELECTRIC MATERIALS;
GATE DIELECTRICS;
GATES (TRANSISTOR);
SILICON COMPOUNDS;
ANODIC OXIDATION;
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EID: 79958024895
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2011.03.015 Document Type: Article |
Times cited : (7)
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References (20)
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