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Volumn 88, Issue 7, 2011, Pages 1573-1575

Charge-trapping MOS memory structure using anodic alumina charging medium

Author keywords

Charge trapping memory; Porous anodic alumina

Indexed keywords

ANODIC ALUMINA; CHARGE TRAPPING MEMORIES; CHARGING/DISCHARGING; DIELECTRIC LAYER; GATE DIELECTRIC STACKS; HIGH-K DIELECTRIC; LOW COSTS; MEMORY STRUCTURE; MEMORY WINDOW; MOS STRUCTURE; POROUS ANODIC ALUMINA; POROUS ANODIC ALUMINUM OXIDES; TUNNEL OXIDES;

EID: 79958024895     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.03.015     Document Type: Article
Times cited : (7)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.