Mask defect auto disposition based on aerial image in mask production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Chen, C Y ^a   Tuo, Laurent ^a   Yoo, C S ^a   Pang, Linyong ^b   Peng, Danping ^b   Sun, Jin ^b  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b Luminescent Technologies Inc   (United States)

Author keywords

Aerial image; AIMS; Mask defect disposition; Mask defect review; Mask inspection

Indexed keywords

AERIAL IMAGE; AIMS; MASK DEFECT DISPOSITION; MASK DEFECT REVIEW; MASK INSPECTION;

COMPUTER SOFTWARE; DATA STORAGE EQUIPMENT; DEFECTS; DIES; INSPECTION; INSPECTION EQUIPMENT; TECHNOLOGY; VERIFICATION;

MASKS;

EID: 69949175509     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824292     Document Type: Conference Paper

References (7)

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