Compensation methods for buried defects in extreme ultraviolet lithography masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Clifford, Chris H ^a   Chan, Tina T ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

buried defect; defect compensation; EUV mask; fast simulation

Indexed keywords

ABSORBER PATTERN; BUMP DEFECTS; BURIED DEFECT; COMPENSATION METHOD; DEFECT COMPENSATION; DESIGN CURVES; EUV MASK; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; EXTREME ULTRAVIOLET MASKS; FAST SIMULATION; CD ERRORS; COMPENSATION STRATEGY; DEFECT PRINTABILITY; EUV MULTILAYERS; EXTREME ULTRAVIOLET MULTILAYERS; FDTD SIMULATIONS; FINITE DIFFERENCE TIME DOMAINS; MARGIN OF ERROR; MULTILAYER MODELS; MULTILAYER SURFACES; NEW MODEL; NON-UNIFORM GRIDS; OPTICAL PATH DIFFERENCE; ORDERS OF MAGNITUDE; REFLECTED FIELDS; REFLECTION COEFFICIENTS; RUNTIMES; SIMULATED IMAGES; SIMULATION DOMAIN; SINGLE PROCESSORS; SPACE PATTERNS; TARGET IMAGES;

MASKS; DEFECTS; ERROR COMPENSATION; FINITE DIFFERENCE TIME DOMAIN METHOD; FORECASTING; OPTICAL MULTILAYERS; PHOTOMASKS; SIMULATORS;

DEFECTS; MULTILAYERS;

EID: 77953445872     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846671     Document Type: Conference Paper

References (5)

1. R. Jonckheere, et al. "Investigation of Mask Defect Density in Full-Field EUV Lithography," presented at 2009 Int. SEMATECH EUVL Symp., Prague, Czech Republic (October 2009).
2. C. H. Clifford, A. R. Neureuther, "Fast simulation methods and modeling for extreme ultraviolet masks with buried defects", J. Micro/Nanolith. MEMS MOEMS 8, 031402 (2009).
3. T. Liang, "Multilayer Defect Compensation to Enable Quality Masks for EUVL Production," presented at 2008 Int. SEMATECH EUVL Symp., Lake Tahoe (September 2008).
4. C. H. Clifford, et al. "Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features," J. Vac. Sci. Technol. B Volume 27, Issue 6, (2009).
5. S. Huh, et al. "A Study of Real Native Defects on EUV Mask Blanks Using a DUV Blank Inspection Tool and SEMATECH AIT," presented at 2009 Int. SEMATECH EUVL Symp., Prague, Czech Republic (October 2009).