Development of a high-bandwidth XY nanopositioning stage for high-rate micro-/nanomanufacturing

IEEE/ASME Transactions on Mechatronics

Volumn 16, Issue 4, 2011, Pages 724-733

  Polit, Sebastian ^a   Dong, Jingyan ^a  

^a North Carolina State University   (United States)

Author keywords

Flexure stage; nanopositioning; parallel kinematic mechanism (PKM); piezoelectric actuator

Indexed keywords

CLOSED-LOOP; CLOSED-LOOP BANDWIDTH; COMPLIANT BEAMS; DECOUPLED MOTION; DESIGN ANALYSIS; DOUBLY CLAMPED BEAM; FLEXURE HINGE; FLEXURE STAGES; FREQUENCY TESTS; HIGH BANDWIDTH; HIGH RATE; LINEAR KINEMATICS; MECHANICAL STRUCTURES; MECHANISM DESIGN; NANO-POSITIONING; NANOPOSITIONING STAGE; OPERATING REGIONS; PARALLEL KINEMATIC MECHANISM (PKM); PARALLEL KINEMATICS; PI CONTROLLER; PIEZOELECTRIC STACK ACTUATORS; POSITIONING SYSTEM; RESONANT FREQUENCIES; VIBRATIONAL MODES; XY STAGE;

BANDWIDTH; CANTILEVER BEAMS; DYNAMIC ANALYSIS; DYNAMIC MECHANICAL ANALYSIS; HINGES; KINEMATICS; MACHINE DESIGN; NATURAL FREQUENCIES; PIEZOELECTRICITY;

PIEZOELECTRIC ACTUATORS;

EID: 79956125765     PISSN: 10834435     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMECH.2010.2052107     Document Type: Article

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