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Volumn , Issue , 2005, Pages 470-473

The ion energy distributions in a high power impulse magnetron plasma

Author keywords

Ion assisted deposition; Plasma source; Power supplies; Sputter deposition

Indexed keywords

GLOW DISCHARGES; IONS; MAGNETRON SPUTTERING; MASS SPECTROMETERS; SPUTTER DEPOSITION;

EID: 33645010701     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (11)
  • 2
    • 0034215825 scopus 로고    scopus 로고
    • Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
    • K. Macak, V. Kouznetsov, J.M. Schneider, U. Helmersson, and I. Petrov, "Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge", J. Vac. Sci. Technol. A, 18 (4), 1533, 2000.
    • (2000) J. Vac. Sci. Technol. A , vol.18 , Issue.4 , pp. 1533
    • Macak, K.1    Kouznetsov, V.2    Schneider, J.M.3    Helmersson, U.4    Petrov, I.5
  • 4
    • 0037010581 scopus 로고    scopus 로고
    • Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
    • J.T. Gudmundsson, J. Alami, and U. Helmersson, "Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge", Surf. and Coat. Technol., 161, 249, 2002.
    • (2002) Surf. and Coat. Technol. , vol.161 , pp. 249
    • Gudmundsson, J.T.1    Alami, J.2    Helmersson, U.3
  • 8
    • 0034318373 scopus 로고    scopus 로고
    • Ionization of sputtered material in a planar magnetron discharge
    • C. Christou and Z.H. Barber, "Ionization of sputtered material in a planar magnetron discharge", J. Vac. Sci. Technol. A, 18 (6), 2897, 2000.
    • (2000) J. Vac. Sci. Technol. A , vol.18 , Issue.6 , pp. 2897
    • Christou, C.1    Barber, Z.H.2
  • 10
    • 0001565023 scopus 로고
    • Low-energy ion irradiation during film growth for reducing defect densities in epitaxial TiN(100) films deposited by reactive-magnetron sputtering
    • L. Hultman, U. Helmersson, S.A. Barnett, J-E. Sundgren, and J.E. Greene, "Low-energy ion irradiation during film growth for reducing defect densities in epitaxial TiN(100) films deposited by reactive-magnetron sputtering", J. Appl. Phys., 61, 552, 1987.
    • (1987) J. Appl. Phys. , vol.61 , pp. 552
    • Hultman, L.1    Helmersson, U.2    Barnett, S.A.3    Sundgren, J.-E.4    Greene, J.E.5
  • 11
    • 0034310534 scopus 로고    scopus 로고
    • Recent progress in large scale manufacturing of multiplayer/superlattice hard coatings
    • P.E. Hovsepian, D.B. Lewis, and W.-D Munz, "Recent progress in large scale manufacturing of multiplayer/superlattice hard coatings", Surf. and Coat. Technol., 133, 166, 2000.
    • (2000) Surf. and Coat. Technol. , vol.133 , pp. 166
    • Hovsepian, P.E.1    Lewis, D.B.2    Munz, W.-D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.