Fabrication of polynomial 3-D nanostructures in Si with a single-step process

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 1, 2011, Pages

  Liu, Dong ^a   Morshed, Shakib ^a   Zhou, Bo ^a   Prorok, Barton C ^a   Lee, Soo Young ^b  

^a AUBURN UNIVERSITY   (United States)

^b AUBURN UNIVERSITY   (United States)

Author keywords

3 D nanolithography; proximity correction; single step lithography

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; REACTIVE ION ETCHING; SILICON;

3-D NANOLITHOGRAPHY; 3D STRUCTURES; ARBITRARY SHAPE; DOSE DISTRIBUTIONS; ETCHING RATIO; HIGH FIDELITY; NANO SCALE; NANOSCALE FEATURES; POLYNOMIAL STRUCTURE; PROXIMITY CORRECTION; SINGLE-STEP; SINGLE-STEP LITHOGRAPHY; SINGLE-STEP PROCESS;

THREE DIMENSIONAL;

EID: 79955957657     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3563601     Document Type: Conference Paper

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