Transferring resist microlenses into silicon by reactive ion etching

Optical Engineering

Volumn 35, Issue 10, 1996, Pages 2979-2982

  Eisner, Martin ^a   Schwider, Johannes ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Microlenses; Reactive ion etching; Roughness

Indexed keywords

EID: 0001140618     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.600981     Document Type: Article

References (7)

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7. B. Gorowitz and R. J. Saja, VLSI Electronics Microstructure Science, Chaps. 8 and 9 in Vol. 8, N. G. Einspruch and D. M. Brown, Eds., Academic Press, New York (1984).