Process optimization and proximity effect correction for gray scale e-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2936-2939

  Murali, Raghunath ^a   Brown, Devin K ^a   Martin, Kevin P ^a   Meindl, James D ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICS; MICROSTRUCTURE; OPTICAL PROPERTIES; OPTIMIZATION; POLYMETHYL METHACRYLATES; PROCESS CONTROL;

EFFECTIVE DOSE-DEPTH (EDD) METHOD; GRAY SCALE FEATURES; PROCESS OPTIMIZATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 33845234612     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2357962     Document Type: Article

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