Dose control for fabrication of grayscale structures using a single step electron-beam lithographic process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2672-2679

  Hu, Fei ^a   Lee, Soo Young ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTALS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ENERGY GAP; ERROR ANALYSIS; MATHEMATICAL MODELS; PROBABILITY;

DIFFRACTIVE OPTICAL ELEMENTS (DOE); PHOTONIC BAND GAP (PBG) CRYSTALS;

OPTOELECTRONIC DEVICES;

EID: 0942267560     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1627808     Document Type: Conference Paper

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