Influence of developer and development conditions on the behavior of high molecular weight electron beam resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3441-3444

  Hasko, D G ^a   Yasin, Shazia ^a   Mumtaz, A ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; MOLECULAR WEIGHT; POLYMETHYL METHACRYLATES; SOLVENTS; SURFACE ROUGHNESS;

ELECTRON BEAM RESISTS;

PHOTORESISTS;

EID: 0034316465     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319834     Document Type: Article

References (15)

1. S. Yasin, D. G. Hasko, and H. Ahmed, J. Vac. Sci. Technol. B 17, 3390 (1999).
2. K. L. Lee, J. Bucchignano, J. Gelorme, and R. Viswanathan, J. Vac. Sci. Technol. B 15, 2621 (1997).
3. Shazia Yasin, A. Mumtaz, D. G. Hasko, F. Carecenac, and H. Ahmed, Microelectron. Eng. 53, 471 (2000).
4. W. Chen and H. Ahmed, Appl. Phys. Lett. 62, 1499 (1993).
5. M. Khoury and D. K. Ferry, J. Vac. Sci. Technol. B 14, 75 (1996).
6. E. A. Dobisz, T. N. Fedynyshyn, D. Ma, L. M. Shirey, and R. Bass, J. Vac. Sci. Technol. B 16, 3773 (1998).
7. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki, and K. Kurihara, Appl. Phys. Lett. 71, 2388 (1997).
8. E. A. Dobisz, S. L. Brandow, R. Bass, and J. Mitterender, J. Vac. Sci. Technol. B 18, 107 (2000).
9. R. A. Pethrick and K. E. Rankin, J. Mater. Chem. 8, 2599 (1998).
10. J. S. Greeneich, J. Electrochem. Soc. 122, 970 (1975).
11. J. S. Papanu, D. S. Soane(Soong), A. T. Bell, and D. W. Hess, J. Appl. Polym. Sci. 38, 859 (1989).
12. M. Doi, Introduction to Polymer Physics (Clarendon, Oxford, 1996).
13. A. Barton, Handbook of Solubility Parameters and other Cohesion Parameters (CRC Press, Cleveland, 1983).
14. K. Hagita, S. Koseki, and H. Takano, J. Phys. Soc. Jpn. 68, 2144 (1999).
15. H.-G. Elias, An Introduction to Polymer Science (VCH, Weinheim, 1997).