A flexible and efficient approach to E-beam proximity effect correction - PYRAMID

Surface and Interface Analysis

Volumn 37, Issue 11, 2005, Pages 919-926

  Lee, Soo Young ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

Convolution; Dose; E beam lithography; Exposure; Hierarchical approach; Point spread function; Proximity effect

Indexed keywords

COMPUTER SIMULATION; CONVOLUTION; ELECTRON SCATTERING; LITHOGRAPHY; MONTE CARLO METHODS; OPTICAL TRANSFER FUNCTION; SCANNING ELECTRON MICROSCOPY;

DOSE; HIERARCHICAL APPROACH; PROXIMITY EFFECT;

ELECTRON BEAMS;

EID: 28744452324     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.2110     Document Type: Conference Paper

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