Charge storage in mesoscopic graphitic islands fabricated using AFM bias lithography

Nanotechnology

Volumn 22, Issue 24, 2011, Pages

  Kurra, Narendra ^a   Prakash, Gyan ^b   Basavaraja, S ^a   Fisher, Timothy S ^b   Kulkarni, G U ^a   Reifenberger, Ronald G ^b  

^a JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

^b PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AFM LITHOGRAPHY; CHARGE STORAGE; CHARGED STATE; ELECTRICAL CONDUCTION; ELECTRICAL TRANSPORT; ELECTROSTATIC FORCE MICROSCOPY; FORCE MICROSCOPY; HIGHLY ORIENTED PYROLYTIC GRAPHITE; INTERMITTENT CONTACT MODES; LITHOGRAPHY PROCESS; MESOSCOPICS; MICRO-RAMAN STUDIES; NONLINEARITIES; OXIDATION PROCESS; POSITIVELY CHARGED; TRENCH GEOMETRY;

ATOMIC FORCE MICROSCOPY; ELECTRIC FORCE MICROSCOPY; ELECTROCHEMICAL OXIDATION; ELECTROSTATIC FORCE; FUNCTIONAL GROUPS; IODINE; PYROLYSIS; SUPERCONDUCTING MATERIALS; VANADIUM;

LITHOGRAPHY;

EID: 79955825997     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/24/245302     Document Type: Article

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