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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 3, 2011, Pages

Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge

(2) Novák, Ondčej a Vlček, Jaroslav a

a UNIVERSITY OF WEST BOHEMIA (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; BI-POLAR MODE; BOMBARDING ENERGIES; DUAL MAGNETRONS; DUTY CYCLES; FAST IONS; GROWING FILMS; ION ENERGY DISTRIBUTIONS; MAGNETRON DISCHARGES; MAGNETRON OPERATIONS; NEGATIVE VOLTAGE; OXYGEN PARTIAL PRESSURE; PHOTO-CATALYTIC; PLASMA-CHEMICAL PROCESS; PULSED DC; REPETITION FREQUENCY; SUBSTRATE SURFACE TEMPERATURE; TARGET POWER DENSITY; TIME-AVERAGED ENERGY; TIO; TITANIUM TARGETS; TOTAL PRESSURE; UNBALANCED MAGNETRON; UNIT VOLUME;

CRYSTALLINE MATERIALS; DC POWER TRANSMISSION; ION BOMBARDMENT; IONS; MAGNETRONS; MASS SPECTROMETRY; OXYGEN; PARTIAL PRESSURE; TITANIUM; TITANIUM DIOXIDE;

FILM GROWTH;

EID: 79955147993 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3563612 Document Type: Article

Times cited : (6)

References (29)

1
- 51649096269
- 0167-5729, 10.1016/S0167-5729(02)00100-0
- U. Diebold, Surf. Sci. Rep. 0167-5729 48, 53 (2003). 10.1016/S0167- 5729(02)00100-0
- (2003) Surf. Sci. Rep. , vol.48 , pp. 53
- Diebold, U.¹

2
- 65449168977
- 0167-5729, 10.1016/j.surfre2008.10.001
- A. Fujishima, X. Zhang, and D. A. Tryk, Surf. Sci. Rep. 0167-5729 63, 515 (2008). 10.1016/j.surfrep.2008.10.001
- (2008) Surf. Sci. Rep. , vol.63 , pp. 515
- Fujishima, A.¹ Zhang, X.² Tryk, D.A.³

3
- 41749121002
- 0169-4332, 10.1016/j.apsusc.2007.12.003
- J. Šícha, J. Musil, M. Meissner, and R. Čerstvý, Appl. Surf. Sci. 0169-4332 254, 3793 (2008). 10.1016/j.apsusc.2007.12.003
- (2008) Appl. Surf. Sci. , vol.254 , pp. 3793
- Šícha, J.¹ Musil, J.² Meissner, M.³ Čerstvý, R.⁴

4
- 77952604121
- 0021-4922, 10.1143/JJAP.49.041105
- N. Ito, S. Miyatake, N. Tsukamoto, N. Oka, Y. Sato, and Y. Shigesato, Jpn. J. Appl. Phys. 0021-4922 49, 041105 (2010). 10.1143/JJAP.49.041105
- (2010) Jpn. J. Appl. Phys. , vol.49 , pp. 041105
- Ito, N.¹ Miyatake, S.² Tsukamoto, N.³ Oka, N.⁴ Sato, Y.⁵ Shigesato, Y.⁶

5
- 0036535467
- 2 films sputtered on unheated substrate
- DOI 10.1016/S0257-8972(01)01553-5, PII S0257897201015535
- P. Zeman and S. Takabayashi, Surf. Coat. Technol. 0257-8972 153, 93 (2002). 10.1016/S0257-8972(01)01553-5 (Pubitemid 34294790)
- (2002) Surface and Coatings Technology , vol.153 , Issue.1 , pp. 93-99
- Zeman, P.¹ Takabayashi, S.²

6
- 0141748179
- 0040-6090, 10.1016/S0040-6090(03)00987-8
- M. Yamagishi, S. Kuriki, P. K. Song, and Y. Shigesato, Thin Solid Films 0040-6090 442, 227 (2003). 10.1016/S0040-6090(03)00987-8
- (2003) Thin Solid Films , vol.442 , pp. 227
- Yamagishi, M.¹ Kuriki, S.² Song, P.K.³ Shigesato, Y.⁴

7
- 33947509524
- 2 films: The effect of repetition frequency
- DOI 10.1007/s11671-007-9042-z
- J. Šícha, D. Hečman, J. Musil, Z. Strýhal, and J. Pavlík, Nanoscale Res. Lett. 1931-7573 2, 123 (2007). 10.1007/s11671-007-9042-z (Pubitemid 46473911)
- (2007) Nanoscale Research Letters , vol.2 , Issue.3 , pp. 123-129
- Sicha, J.¹ Herman, D.² Musil, J.³ Stryhal, Z.⁴ Pavlik, J.⁵

8
- 24644486011
- Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature
- DOI 10.1016/j.surfcoat.2005.01.018, PII S0257897205000757
- D. GlöΒ, P. Frach, O. Zywitzki, T. Modes, S. Klinkenberg, and C. Gottfried, Surf. Coat. Technol. 0257-8972 200, 967 (2005). 10.1016/j.surfcoat.2005.01.018 (Pubitemid 41282331)
- (2005) Surface and Coatings Technology , vol.200 , Issue.1-4 SPEC. ISS. , pp. 967-971
- Gloss, D.¹ Frach, P.² Zywitzki, O.³ Modes, T.⁴ Klinkenberg, S.⁵ Gottfried, C.⁶

9
- 1842815759
- Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering
- DOI 10.1016/j.surfcoat.2003.10.115, PII S0257897203012775
- O. Zywitzki, T. Modes, H. Sahm, P. Frach, K. Goedicke, and D. Glöss, Surf. Coat. Technol. 0257-8972 180-181, 538 (2004). 10.1016/j.surfcoat.2003.10. 115 (Pubitemid 38473623)
- (2004) Surface and Coatings Technology , vol.180-181 , pp. 538-543
- Zywitzki, O.¹ Modes, T.² Sahm, H.³ Frach, P.⁴ Goedicke, K.⁵ Gloss, D.⁶

10
- 79955145712
- 1612-8850 doi: 10.1002/ppa201000131.
- J. Šícha, O. Novák, J. Vlček, and P. Kudláček, Plasma Processes Polym. 1612-8850 doi: 10.1002/ppap.201000131.
- Plasma Processes Polym.
- Šícha, J.¹ Novák, O.² Vlček, J.³ Kudláček, P.⁴

11
- 13644271815
- 2 films deposited by reactive sputtering in mid-frequency mode with dual cathodes
- DOI 10.1143/JJAP.43.8234
- S. Ohno, D. Sato, M. Kon, Y. Sato, M. Yoshikawa, P. Frach, and Y. Shigesato, Jpn. J. Appl. Phys., Part 1 0021-4922 43, 8234 (2004). 10.1143/JJAP.43.8234 (Pubitemid 40232453)
- (2004) Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers , vol.43 , Issue.12 , pp. 8234-8241
- Ohno, S.¹ Sato, D.² Kon, M.³ Sato, Y.⁴ Yoshikawa, M.⁵ Frach, P.⁶ Shigesato, Y.⁷

12
- 28044467163
- 2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
- DOI 10.1016/j.tsf.2005.08.252, PII S0040609005014975, Proceedings of the Fourth International Symposium on Transparent Oxide Thin Film for Electronics and Optics (TOEO-4)
- S. Ohno, N. Takasawa, Y. Sato, M. Yoshikawa, K. Suzuki, P. Frach, and Y. Shigesato, Thin Solid Films 0040-6090 496, 126 (2006). 10.1016/j.tsf.2005.08.252 (Pubitemid 41689875)
- (2006) Thin Solid Films , vol.496 , Issue.1 , pp. 126-130
- Ohno, S.¹ Takasawa, N.² Sato, Y.³ Yoshikawa, M.⁴ Suzuki, K.⁵ Frach, P.⁶ Shigesato, Y.⁷

13
- 5744230452
- 0863-1042, 10.1002/ctp200410083
- J. Vlček, A. D. Pajdarová, and J. Musil, Contrib. Plasma Phys. 0863-1042 44, 426 (2004). 10.1002/ctpp.200410083
- (2004) Contrib. Plasma Phys. , vol.44 , pp. 426
- Vlček, J.¹ Pajdarová, A.D.² Musil, J.³

14
- 65449180011
- 0022-3727, 10.1088/0022-3727/42/9/093001
- J. W. Bradley and T. Welzel, J. Phys. D 0022-3727 42, 093001 (2009). 10.1088/0022-3727/42/9/093001
- (2009) J. Phys. D , vol.42 , pp. 093001
- Bradley, J.W.¹ Welzel, T.²

15
- 0027908068
- 0257-8972, 10.1016/0257-8972(93)90248-M
- S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, and F. Milde, Surf. Coat. Technol. 0257-8972 61, 331 (1993). 10.1016/0257-8972(93) 90248-M
- (1993) Surf. Coat. Technol. , vol.61 , pp. 331
- Schiller, S.¹ Goedicke, K.² Reschke, J.³ Kirchhoff, V.⁴ Schneider, S.⁵ Milde, F.⁶

16
- 13444266367
- Reactive magnetron sputtering of thin films: Present status and trends
- DOI 10.1016/j.tsf.2004.07.041, PII S0040609004009332
- J. Musil, P. Baroch, J. Vlček, K. H. Nam, and J. G. Han, Thin Solid Films 0040-6090 475, 208 (2005). 10.1016/j.tsf.2004.07.041 (Pubitemid 40210991)
- (2005) Thin Solid Films , vol.475 , Issue.1-2 SPEC. ISS. , pp. 208-218
- Musil, J.¹ Baroch, P.² Vlcek, J.³ Nam, K.H.⁴ Han, J.G.⁵

17
- 38049174199
- 0257-8972, 10.1016/j.surfcoat.2007.08.075
- H. Toku, R. S. Pessoa, H. S. Maciel, M. Massi, and U. A. Mengui, Surf. Coat. Technol. 0257-8972 202, 2126 (2008). 10.1016/j.surfcoat.2007.08.075
- (2008) Surf. Coat. Technol. , vol.202 , pp. 2126
- Toku, H.¹ Pessoa, R.S.² MacIel, H.S.³ Massi, M.⁴ Mengui, U.A.⁵

18
- 33646698210
- 2 films
- DOI 10.1116/1.2187993
- J. Musil, D. Hečman, and J. Šícha, J. Vac. Sci. Technol. A 0734-2101 24, 521 (2006). 10.1116/1.2187993 (Pubitemid 43731715)
- (2006) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.24 , Issue.3 , pp. 521-528
- Musil, J.¹ Heman, D.² Sicha, J.³

19
- 3142736384
- 0267-0844, 10.1179/026708404225016355
- J. W. Bradley, S. Karkari, and A. Vetushka, Surf. Eng. 0267-0844 20, 186 (2004). 10.1179/026708404225016355
- (2004) Surf. Eng. , vol.20 , pp. 186
- Bradley, J.W.¹ Karkari, S.² Vetushka, A.³

20
- 79955127776
- Society of Vacuum Coaters 505/856-7188, (unpublished)
- W. Zhu, J. Lopez, A. Belkind, and Society of Vacuum Coaters 505/856-7188, Proceedings of the 48th Annual Technical Conference Proceedings, 2005 (unpublished), p. 62.
- (2005) Proceedings of the 48th Annual Technical Conference Proceedings , pp. 62
- Zhu, W.¹ Lopez, J.² Belkind, A.³

21
- 0036576044
- The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge
- DOI 10.1088/0963-0252/11/2/307, PII S0963025202346759
- J. W. Bradley, H. Bäcker, Y. Aranda-Gonzalvo, P. J. Kelly, and R. D. Arnell, Plasma Sources Sci. Technol. 0963-0252 11, 165 (2002). 10.1088/0963-0252/11/2/307 (Pubitemid 34697197)
- (2002) Plasma Sources Science and Technology , vol.11 , Issue.2 , pp. 165-174
- Bradley, J.W.¹ Backer, H.² Aranda-Gonzalvo, Y.³ Kelly, P.J.⁴ Arnell, R.D.⁵

22
- 0037206621
- Investigation of the pulsed magnetron discharge by time- and energy-resolved mass spectrometry
- DOI 10.1016/S0042-207X(02)00380-9, PII S0042207X02003809
- M. Mišina, J. W. Bradley, H. Bäcker, Y. Aranda-Gonzalvo, S. K. Karkari,and D. Forder, Vacuum 0042-207X 68, 171 (2002). 10.1016/S0042- 207X(02)00380-9 (Pubitemid 35167593)
- (2002) Vacuum , vol.68 , Issue.2 , pp. 171-181
- Misina, M.¹ Bradley, J.W.² Backer, H.³ Aranda-Gonzalvo, Y.⁴ Karkari, S.K.⁵ Forder, D.⁶

23
- 0037472613
- Electrostatic quadrupole plasma mass spectrometer and Langluir probe measurements of mid-frequency pulsed DC magnetron discharges
- DOI 10.1016/S0257-8972(02)00478-4, PII S0257897202004784
- C. Muratore, J. J. Moore, and J. A. Rees, Surf. Coat. Technol. 0257-8972 163-164, 12 (2003). 10.1016/S0257-8972(02)00478-4 (Pubitemid 36122263)
- (2003) Surface and Coatings Technology , vol.163-164 , pp. 12-18
- Muratore, C.¹ Moore, J.J.² Rees, J.A.³

24
- 11144239640
- A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges
- DOI 10.1063/1.1808481, 8
- T. Welzel, T. Dunger, H. Kupfer, and F. Richter, J. Appl. Phys. 0021-8979 96, 6994 (2004). 10.1063/1.1808481 (Pubitemid 40048646)
- (2004) Journal of Applied Physics , vol.96 , Issue.12 , pp. 6994-7001
- Welzel, Th.¹ Dunger, Th.² Kupfer, H.³ Richter, F.⁴

25
- 34848905330
- Measurement of energy transfer at an isolated substrate in a pulsed dc magnetron discharge
- DOI 10.1063/1.2779287
- M. Čada, J. W. Bradley, G. C. B. Clarke, and P. J. Kelly, J. Appl. Phys. 0021-8979 102, 063301 (2007). 10.1063/1.2779287 (Pubitemid 47508905)
- (2007) Journal of Applied Physics , vol.102 , Issue.6 , pp. 063301
- Cada, M.¹ Bradley, J.W.² Clarke, G.C.B.³ Kelly, P.J.⁴

26
- 59249090402
- 1367-2630, 10.1088/1367-2630/10/12/123008
- T. Welzel, T. Dunger, B. Liebig, and F. Richter, New J. Phys. 1367-2630 10, 123008 (2008). 10.1088/1367-2630/10/12/123008
- (2008) New J. Phys. , vol.10 , pp. 123008
- Welzel, T.¹ Dunger, T.² Liebig, B.³ Richter, F.⁴

27
- 70349423599
- 1612-8850, 10.1002/ppa200731303
- D. Hečman, J. Šícha, and J. Musil, Plasma Processes Polym. 1612-8850 4, S531 (2007). 10.1002/ppap.200731303
- (2007) Plasma Processes Polym. , vol.4 , pp. 531
- Hečman, D.¹ Šícha, J.² Musil, J.³

28
- 1842425986
- 2-assisted photocatalytic degradation of azo dyes in aqueous solution: Kinetic and mechanistic investigations: A review
- DOI 10.1016/j.apcatb.2003.11.010, PII S0926337303005411
- I. K. Konstantinou and T. A. Albanis, Appl. Catal., B 0926-3373 49, 1 (2004). 10.1016/j.apcatb.2003.11.010 (Pubitemid 38448836)
- (2004) Applied Catalysis B: Environmental , vol.49 , Issue.1 , pp. 1-14
- Konstantinou, I.K.¹ Albanis, T.A.²

29
- 0035387379
- Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering
- DOI 10.1016/S0257-8972(01)01071-4, PII S0257897201010714, Proceedings of the 7th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 17-21, 2000
- M. Mišina, L. R. Shaginyan, M. Maček, and P. Panjan, Surf. Coat. Technol. 0257-8972 142-144, 348 (2001). 10.1016/S0257-8972(01)01071-4 (Pubitemid 32931735)
- (2001) Surface and Coatings Technology , vol.142-144 , pp. 348-354
- Misina, M.¹ Shaginyan, L.R.² Macek, M.³ Panjan, P.⁴

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