In-situ analyses on reactive sputtering processes to deposit photocatalytic TiO2 films

Japanese Journal of Applied Physics

Volumn 49, Issue 4 PART 1, 2010, Pages 0411051-0411055

  Ito, Norihiro ^a,b   Miyatake, Shohei ^a   Tsukamoto, Naoki ^a   Oka, Nobuto ^a   Sato, Yasushi ^a   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE TIO; CATHODE SHEATH; CATHODE VOLTAGES; ENERGY ANALYZER; HIGH ENERGY; IN-SITU ANALYSIS; NEGATIVE OXYGEN IONS; OXYGEN FLOW RATIOS; PHOTO-CATALYTIC; PHOTOCATALYTIC ACTIVITIES; QUADRUPOLE MASS SPECTROMETER; REACTIVE SPUTTERING PROCESS; RECOMBINATION CENTERS; TARGET SURFACE; TIO; TOTAL GAS PRESSURE;

DEPOSITS; ELECTRIC FIELDS; IONS; MASS SPECTROMETRY; OXYGEN; TARGETS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH ENERGY PHYSICS;

EID: 77952604121     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.041105     Document Type: Article

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