Development of ultraviolet crosslinking glucose-based resist materials for advanced electronic device applications using nanoimprint lithography

Japanese Journal of Applied Physics

Volumn 50, Issue 1 PART 3, 2011, Pages

  Takei, Satoshi ^a,b  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS-LINKED FILMS; CROSSLINKED POLYMER NETWORKS; ELECTRONIC DEVICE; ELEMENTAL ANALYSIS; EPOXY GROUP; GLUCOSE DERIVATIVES; LINE PATTERN; LINE PATTERNING; MASS PRODUCTION; NANOPATTERNING; RESIST MATERIALS; ULTRAVIOLET CROSSLINKING; ULTRAVIOLET IRRADIATIONS;

CATIONIC POLYMERIZATION; GLUCOSE; MATERIALS; THERMOELECTRIC EQUIPMENT;

NANOIMPRINT LITHOGRAPHY;

EID: 79955130171     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.01BA02     Document Type: Conference Paper

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