Development of molecular resists based on Phenyl[4]calixarene derivatives

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Echigo, Masatoshi ^a   Hayashi, Hiromi ^a   Oizumi, Hiroaki ^b   Matsumaro, Kazuyuki ^b   Itani, Toshiro ^b  

^a MITSUBISHI GAS CHEMICAL COMPANY INC   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Calix 4 resorcinarene; EB; EUV; LER; lithography; LWR; molecular resist; negative tone; positive tone

Indexed keywords

CALIX[4]RESORCINARENE; CALIX[4]RESORCINARENES; MOLECULAR RESISTS; NEGATIVE TONES; POSITIVE-TONE;

ETHERS; GLYCOLS; PROPYLENE;

LITHOGRAPHY;

EID: 77953499344     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846475     Document Type: Conference Paper

References (11)

1. H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii, J. Vac. Sci. Tecnol. B7 (1989) 1648.
2. ITRS, International Technology Roadmap for Semiconductors, Lithography, http://public.itrs.net/, 2008.
3. S. Wurm, O. Wood and P. Naulleau, presented at the 7th International EUV Symposium, 29 September to 1 October, 2008, Lake Tahoe.
4. H. Iimori, Y. Shibasaki, M. Ueda and H. Ishii, J. Photopolym. Sci. Technol., 16 (2003) 685.
5. S. Chang, D. Yang, J. Dai, N. Felix, D. Bratton, K. Tsuchiya, Y. Kwark, J. Bravo, C. Ober, H. Cao and H. Deng, Proc SPIE, 5753 (2005) 5.
6. R. Ramakrishnan, S. Chang, N. Felix, H. Cao, H. Deng, W. Yueh and C. Ober, J. Photopolym. Sci. Technol., 19 (2006) 515.
7. H. Oizumi, T. Kumise and T. Itani , J. Photopolym. Sci. Technol., 21 (2008) 443.
8. D. Bratton, R. Ayothi, N. Felix, H. Cao, H. Deng and C. Ober, Proc SPIE, 6153 (2006) 61531D-1.
9. M. Echigo and D. Oguro, Proc SPIE, 6153 (2009) 7273-155.
10. K. Tawarayama, S. Magoshi, Y. Tanaka, S. Shirai and H. Tanaka, Jpn. J. Appl. Phys., 47 (2008) 4866.
11. H. Oizumi, D. Kawamura, K. Kaneyama, S. Kobayashi and T. Itani, Proc SPIE (2009) 7273-111.