Simulation study on bubble trapplng ln UV nanoimprint lithography

Journal of Photopolymer Science and Technology

Volumn 22, Issue 2, 2009, Pages 171-174

  Nagaoka, Yoshinori ^a,c   Morihara, Daisuke ^a   Hiroshima, Hiroshi ^b,c   Hirai, Yoshihiko ^a  

^a Osaka Prefecture University   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Bubble trap; Contact angle; Polymer; Resist; Surface tension; Template; UV nanoimprint; Viscos flow

Indexed keywords

EID: 70350142188     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.171     Document Type: Article

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