Advanced step and flash nanoimprint lithography using UV-sensitive hard mask underlayer material

Micro and Nano Letters

Volumn 5, Issue 2, 2010, Pages 117-120

  Takei, S ^a,b,c   Ogawa, T ^b   Deschner, R ^b   Hanabata, M ^c   Willson, C G ^b  

^a NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLATE GROUPS; CONTAMINATION PROBLEM; HARD MASKS; HIGH RESOLUTION; HIGH-ADHESION; LINE EDGE ROUGHNESS; METHACRYLATE GROUPS; NANO-IMPRINT; NEW APPROACHES; POLYMERISATION; RESIDUAL THICKNESS; RESIST MATERIALS; SPIN-ON; UNDERLAYERS; UV IRRADIATION;

ADHESION; IRRADIATION;

NANOIMPRINT LITHOGRAPHY;

METHACRYLIC ACID; NANOMATERIAL;

ARTICLE; MATERIALS TESTING; NANOTECHNOLOGY; POLYMERIZATION; ULTRAVIOLET IRRADIATION;

EID: 77956247380     PISSN: None     EISSN: 17500443     Source Type: Journal    
DOI: 10.1049/mnl.2010.0014     Document Type: Article

References (10)

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