SCOPUS 정보 검색 플랫폼

Volumn 20, Issue 24, 2010, Pages 5025-5029

Wafer-scale colloidal lithography based on self-assembly of polystyrene nanospheres and atomic layer deposition

(8) Oh, Jeong Rok a Moon, Jung Ho a Park, Hoo Keun a Park, Jae Hyoung a Chung, Haegeun b Jeong, Jinhoo b Kim, Woong b Do, Young Rag a

a Kookmin University (South Korea)

b Korea University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDAL LITHOGRAPHY; HIGH REPRODUCIBILITY; HOLE SIZE; MASS FABRICATION; NOVEL METHODS; PHOSPHOR FILM; WAFER-SCALE;

ATOMIC LAYER DEPOSITION; LIGHT EMISSION; LIGHT EMITTING DIODES; LITHOGRAPHY; NANOSPHERES; OPTOELECTRONIC DEVICES; PHOTONIC CRYSTALS; POLYSTYRENES; SELF ASSEMBLY; SILICON NITRIDE; TWO DIMENSIONAL;

ATOMS;

EID: 77953574906 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b927532k Document Type: Article

Times cited : (30)

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