Nano-porous electrode systems by colloidal lithography for sensitive electrochemical detection: Fabrication technology and properties

Journal of Micromechanics and Microengineering

Volumn 18, Issue 11, 2008, Pages

  Lohmüller, Theobald ^c   Müller, Ulrich ^a   Breisch, Stefanie ^a   Nisch, Wilfried ^a   Rudorf, Ralf ^a   Schuhmann, Wolfgang ^b   Neugebauer, Sebastian ^b   Kaczor, Markus ^e   Linke, Stephan ^e   Lechner, Sebastian ^c,d   Spatz, Joachim ^c,d   Stelzle, Martin ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^d UNIVERSITY OF HEIDELBERG   (Germany)

^e MEAS Deutschland GmbH HL Planartechnik   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION; CHEMICAL SENSORS; ELECTROCHEMICAL PROPERTIES; ELECTRODES; ETCHING; FABRICATION; LEAKAGE CURRENTS; LITHOGRAPHY; METAL INSULATOR BOUNDARIES; METALS; MIM DEVICES; REACTIVE ION ETCHING; SELF ASSEMBLY; SEMICONDUCTOR INSULATOR BOUNDARIES; SENSORS;

AMPLIFICATION FACTORS; BOTTOM ELECTRODES; COLLOIDAL LITHOGRAPHIES; COLLOIDAL SPHERES; DEFECT MECHANISMS; DIAGNOSTIC ASSAYS; ELECTRO ACTIVES; ELECTROCHEMICAL DETECTIONS; ETCHING PROCESSES; FABRICATION PROCESSES; FABRICATION TECHNOLOGIES; FILM DEPOSITIONS; HIGH DEFINITIONS; HIGH YIELDS; INFRARED MICROSCOPIES; INSULATOR THICKNESSES; INTER-CONNECTS; INTERDIGITATED ELECTRODE ARRAYS; METAL LAYERS; METAL SENSORS; OF SENSORS; POROUS ELECTRODES; POROUS METALS; RANDOM PARTICLES; REACTIVE IONS; REDOX CYCLING; SHORT CIRCUITS; SUBLIMATION PROCESSES;

ELECTROCHEMICAL ELECTRODES;

EID: 58149339567     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/11/115011     Document Type: Article

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