Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography

Nanotechnology

Volumn 20, Issue 48, 2009, Pages

  Popa, Ana Maria ^a,b   Niedermann, Philippe ^a   Heinzelmann, Harry ^a   Hubbell, Jeffrey A ^b   Pugin, Raphal ^a  

^a CSEM   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER MICELLES; MEAN PORE DIAMETERS; METALLIC MASKS; MICROTECHNOLOGY; NANOPORE ARRAY; NANOPOROUS MEMBRANE; SELF-ASSEMBLED; THIN METAL FILMS; ULTRATHIN SILICON; WAFER SCALE FABRICATION;

ASPECT RATIO; COPOLYMERIZATION; METALLIC COMPOUNDS; NANOPORES; REACTIVE ION ETCHING; SELF ASSEMBLED MONOLAYERS; SILICON NITRIDE; SILICON OXIDES; SILICON WAFERS;

SEMICONDUCTING SILICON COMPOUNDS;

METAL; SILICON NITRIDE;

ARTICLE; MICELLE; NANOPORE; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY;

EID: 70449769317     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/48/485303     Document Type: Article

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