Surface layer determination for the Si spheres of the Avogadro project

Metrologia

Volumn 48, Issue 2, 2011, Pages

  Busch, I ^a   Azuma, Y ^b   Bettin, H ^a   Cibik, L ^a   Fuchs, P ^c   Fujii, K ^b   Krumrey, M ^a   Kuetgens, U ^a   Kuramoto, N ^b   Mizushima, S ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c Bundesamt für Metrologie METAS ^*  (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL METHOD; AVOGADRO CONSTANT; CHEMICAL COMPOSITIONS; MACROSCOPIC DENSITY; METALLIC CONTAMINATION; SILICON SURFACES; SPHERE SURFACES; STANDARD UNCERTAINTY; SURFACE LAYERS; VOLUME DETERMINATION; X-RAY REFLECTOMETRY;

CHEMICAL COMPOUNDS; CONTAMINATION; COPPER; SILICIDES; SILICON; SURFACE STRUCTURE;

SPHERES;

EID: 79953700009     PISSN: 00261394     EISSN: 16817575     Source Type: Journal    
DOI: 10.1088/0026-1394/48/2/S10     Document Type: Article

References (52)

1. Becker P, Bettin H, Danzebrink H-U, Gläser M, Kuetgens U, Nicolaus A, Schiel D, De Bièvre P, Valkiers S and Taylor P 2003 Determination of the Avogadro constant via the silicon route Metrologia 40 271-87
2. Becker P, De Bièvre P, Fujii K, Gläser M, Inglis B, Luebbig H and Mana G 2007 Considerations on future redefinitions of the kilogram, the mole and of other units Metrologia 44 1-14 (Pubitemid 46620784)
3. 28Si for the precise determination of the Avogadro constant Meas. Sci. Technol. 17 1854-60 (Pubitemid 43958864)
4. Becker P, Friedrich H, Fuji K, Giardini W, Mana G, Picard A, Pohl H-J, Riemann H and Valkiers S 2009 The Avogadro constant determination via enriched silicon-28 Meas. Sci. Technol. 20 092002
5. 28Si crystal for a new kilogram definition Metrologia 48 S1-13
6. 28Si determined by IDMS Metrologia 48 S20-5
7. 28Si x-ray interferometer Metrologia 48 S37-43
8. 28Si spheres for the Avogadro project Metrologia 48 S112-9
9. 28Si with a spherical Fizeau interferometer Metrologia 48 S96-103
10. 28Si spheres using an interferometer with a flat etalon to determine the Avogadro constant Metrologia 48 S83-95
11. Busch I, Danzebrink H-U, Krumrey M, Borys M and Bettin H 2009 Oxide layer mass determination at the silicon sphere of the Avogadro project IEEE Trans. Instrum. Meas. 58 891-6
12. Kuramoto N, Fujii K, Azuma Y, Mizushima S and Toyoshima Y 2007 Density determination of silicon spheres using an interferometer with optical frequency tuning IEEE Trans. Instrum. Meas. 56 476-80 (Pubitemid 46541948)
13. Leistner A J and Giardini W J 1994 Fabrication and sphericity of single-crystal silicon spheres Metrologia 31 231-43
14. Leistner A and Zosi G 1987 Polishing a 1-kg silicon sphere for a density standard Appl. Opt. 26 600
15. Picard A, Bignell N, Downes S and Mizushima S 2009 Mass comparison of the 1 kg silicon sphere AVO#3 traceable to the International Prototype K Metrologia 46 1-10
16. Kuramoto N, Fujii K, Nicolaus A, Bartl G, Gray M, Manson P and Giardini W 2011 Diameter comparison of a silicon sphere for the international Avogadro coordination project IEEE Trans. Instrum. Meas. at press
17. 2 on Si: V. Results of a CCQM pilot study Surf. Interface Anal. 36 1269-303
18. 2/Si(100) surfaces to realize precise mass measurements Metrologia 41 137-44
19. Kato T and Kudo H 1997 Method for production of silicon wafer and apparatus therefore US Patent No 5,679,212 (21 October 1997)
20. 2 on Si: II. Issues in quantification of the oxide thickness Surf. Interface Anal. 33 640-52 (Pubitemid 34950133)
21. Fuchs P 2009 Low-pressure plasma cleaning of Au and PtIr noble metal surfaces Appl. Surf. Sci. 255 1382-90
22. Nicolaus R A and Bönsch G 2005 Absolute volume determination of a silicon sphere with the spherical interferometer of the PTB Metrologia 42 24-31 (Pubitemid 40308346)
23. Beckhoff B et al 2009 A quarter-century of metrology using synchrotron radiation by PTB in Berlin Physica Status Solidi b 246 1415-34
24. Naftel S J, Coulthard I, Sham T K, Xu D-X, Erickson L and Das S R 1999 Electronic structure of nickel silicide in subhalf-micron lines and blanket films: An x-ray absorption fine structures study at the Ni and SiL3,2 edge Appl. Phys. Lett. 74 2893
25. Iacobucci S, Montagnoli M, Sancrotti M, Rossi G and Sacchi M 1994 Absorption spectroscopy at the Cu-2p edges in Cu/Si(1 1 1) 7 × 7 interface Solid State Commun. 91 989
26. Börner M 1989 PhD Thesis University of Frankfurt, Germany
27. Qin M, Poon M C and Yue C Y 2000 A study of nickel silicide film as a mechanical material Sensors Actuators 87 90
28. Fuchs D, Krumrey M, Müller P, Scholze F and Ulm G 1995 High precision soft X-ray reflectometer Rev. Sci. Instrum. 66 2248-50
29. Hol V, Pietsch U and Baumbach T 1999 High-Resolution X-ray Scattering from Thin Films and Multilayers (Springer Tracts in Modern Physics vol 149) (Berlin: Springer)
30. Busch I 2004 Röntgenreflektometrie und diffuse Röntgenstreuung zur Charakterisierung von Grenzflächenrauheiten und Grenzflä chenmorphologien im Bereich der Nanometrologie PhD Thesis Technical University, Braunschweig, Germany
31. 2 films on Si with x-ray reflectometry at the Si K edge Thin Solid Films 459 241-4
32. Krumrey M, Gleber G, Scholze F and Wernecke J 2011 Synchrotron radiation-based x-ray reflection and scattering techniques for dimensional nanometrology Meas. Sci. Technol. at press
33. Parrat L G 1954 Surface studies of solids by total reflection of x-rays Phys. Rev. 95 359-69
34. Azaam R M A and Bashara N M 1986 Ellipsometry and Polarized Light (Amsterdam: Elsevier)
35. Tompkins H G and Irene E A 2005 Handbook of Ellipsometry (Norwich, NY: William Andrew Publishing)
36. Winelli II Vers. 2.2.0.7, Sopralab, 2009
37. WinSE for GES5E, Vers. 2.8.4.36, Sopralab, 2009
38. Bureau International des Poids et Measures 2006 Le Système International d'Unités (SI) 8th edn (Sèvres: BIPM)
39. Mohr P J, Taylor B N and Newell D B 2008 CODATA Recommended values of the fundamental physical constants: 2006 Rev. Mod. Phys. 80 633-730
40. Watanabe T, Fujimoto H, Nakayama K, Masuda T and Kajitani M 2003 Recent developments in traceable dimensional measurements: II Proc. SPIE 5190 400-9
41. 2 thin films on Si substrate by heating in atmosphere Japan. J. Appl. Phys. 44 8256-8 (Pubitemid 43161232)
42. Fujiwara H 2007 Spectroscopic Ellipsometry: Principles and Applications (Chichester: Wiley)
43. Palik E D 1985 Handbook of Optical Constants of Solids (New York: Academic)
44. -1991 Elli 4.5 for ES4G SOPRA
45. Sakuma A, Fujii K and Tanaka M 1994 Experimental determination of the volume of a crystalline silicon sphere using spherical harmonics Meas. Sci. Technol. 5 1233-8
46. D R Lide (ed) 1996 Handbook of Chemistry and Physics 77th edn (Boca Raton, FL: CRC Press) pp 10-265
47. Verkouteren J R and Leigh S D 2000 New low-index liquid refractive index standard: SRM 1922 Fresenius J. Anal. Chem. 367 226-31
48. The Chemical Society of Japan (ed) 1993 Kagakubinran kisohen vol II 4th edn (Tokyo: Maruzen) pp 515-8
49. Amiotti M, Borghesi A, Guizzetti G and Nava F 1990 Optical properties of polycrystalline nickel silicides Phys. Rev. B 42 8939-46
50. Weast R C (ed) 1981-1982 Handbook of Chemistry and Physics 62nd edn (Boca Raton, FL: CRC Press)
51. Picard A and Fang H 2004 Methods to determine water vapour sorption on mass standards Metrologia 41 333-9
52. GUM Workbench Version 1.2.11.56 Win32, 1996-1999 by Metrodata GmbH, Basler Strae 18, 79639 Grenzach-Wyhlen, Germany