Density determination of silicon spheres using an interferometer with optical frequency tuning

IEEE Transactions on Instrumentation and Measurement

Volumn 56, Issue 2, 2007, Pages 476-480

  Kuramoto, Naoki ^a   Fujii, Kenichi ^a   Azuma, Yasushi ^a   Mizushima, Shigeki ^a   Toyoshima, Yasutake ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Avogadro's constant; Ellipsometry; Interferometry; Optical frequency tuning; Silicon crystal; X ray crystal density method; X ray photoelectron spectroscopy (XPS); X ray reflectometry (XRR)

Indexed keywords

DENSITY MEASUREMENT (OPTICAL); ELLIPSOMETRY; INTERFEROMETERS; REFLECTOMETERS; TUNING; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSOLUTE DENSITY MEASUREMENT; AVOGADRO'S CONSTANT; OPTICAL FREQUENCY TUNING; X-RAY REFLECTOMETRY;

SEMICONDUCTING SILICON;

EID: 34047210663     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/TIM.2007.890616     Document Type: Conference Paper

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