Thickness determination for SiO2 films on Si by X-ray reflectometry at the Si K edge

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 241-244

  Krumrey, M ^a   Hoffmann, M ^a   Ulm, G ^a   Hasche, K ^a   Thomsen Schmidt, P ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Silicon; Silicon oxide; X ray reflectometry

Indexed keywords

ATTENUATION; COPPER; CRYSTALS; INTERFACES (MATERIALS); OSCILLATIONS; RADIATION; REFLECTOMETERS; SILICA; SILICON; SYNCHROTRON RADIATION; TRANSMISSION ELECTRON MICROSCOPY; WAVE INTERFERENCE;

PHOTON ENERGY; SEMICONDUCTOR INDUSTRY; X-RAY REFLECTOMETRY; X-RAY REFLECTOMETRY (XRR);

THIN FILMS;

EID: 2942622287     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.100     Document Type: Conference Paper

References (12)

1. Parrat L.G. Phys. Rev. 95:1954;359.
2. Cowley R.A., Ryan T.W. J. Appl. Phys. 20:1987;61.
3. Banerjee S., Chakraborty S., Lai P.T. Appl. Phys. Lett. 80:2002;3075.
4. Awaji N., Sugita Y., Nakanishi T., Ohkubo S., Takasaki K., Komiya S. J. Vac. Sci. Technol. A. 14:1996;971.
5. Duda J.A., Richter C.A., Majkrzak C.F., Nguyen N.V. Appl. Phys. Lett. 73:1999;2131.
6. Heald S.M., Jayanetti J.K.D., Bright A.A., Rubloff G.W. J. Vac. Sci. Technol. A. 8:1990;2046.
7. Owens A., Fraser G.W., Gurman S.J. Rad. Phys. Chem. 65:2002;109.
8. Klein R., Krumrey M., Richter M., Scholze F., Thornagel R., Ulm G. Synchrotron Radiation News. 15:2002;23.
9. Krumrey M., Ulm G. Nucl. Instrum. Meth. A. 467-468:2001;1175.
10. Fuchs D., Krumrey M., Müller P., Scholze F., Ulm G. Rev. Sci. Instrum. 66:1995;2248.
11. K. Hasche, G. Ulm, K. Herrmann, M. Krumrey, G. Ade, J. Stümpel, I. Busch, P. Thomsen-Schmidt, S. Schädlich, A. Schindler, W. Frank, M. Procop, U. Beck, St. Louis, USA, July 2002, Proceedings of the American Society for Precision Engineering (ASPE) Annual Meeting 27 (2002) 57.
12. Windt D.L. Comput. Phys. 12:1998;360.