Oxide layer mass determination at the silicon sphere of the Avogadro project

IEEE Transactions on Instrumentation and Measurement

Volumn 58, Issue 4, 2009, Pages 891-896

  Busch, Ingo ^a   Danzebrink, Hans Ulrich ^a   Krumrey, Michael ^a   Borys, Michael ^a   Bettin, Horst ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Avogadro; Density; Ellipsometry; Flotation; Silicon; Silicon oxide; Surface; X ray reflectometry (XRR)

Indexed keywords

ELLIPSOMETRY; FLOTATION; NONMETALS; OXIDES; PHOTOMAPPING; REFLECTION; REFLECTOMETERS; SILICA; SILICON COMPOUNDS; STOICHIOMETRY; THICKNESS GAGES; THICKNESS MEASUREMENT; UNCERTAINTY ANALYSIS;

AVOGADRO; AVOGADRO CONSTANTS; CRITICAL TASKS; DENSITY; LATTICE PLANES; MASS DETERMINATIONS; OXIDE LAYERS; SI CRYSTALS; SPECTRAL ELLIPSOMETRIES; THERMAL OXIDATIONS; THICKNESS DETERMINATIONS; UNCERTAINTY BUDGETS; WELL-DEFINED STRUCTURES; X-RAY REFLECTOMETRY (XRR);

SPHERES;

EID: 63449096169     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/TIM.2008.2007037     Document Type: Conference Paper

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