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Current Applied Physics
Volumn 11, Issue 1 SUPPL., 2011, Pages
Effects of thickness and annealing on the properties of Ti-doped ZnO films by radio frequency magnetron sputtering
Author keywords

Annealing; RF magnetron sputtering; Ti doped ZnO (TZO); Transparent conductive oxide (TCO)
Indexed keywords

ANNEALED FILMS; ANNEALING CONDITION; ANNEALING TIME; ARGON AMBIENT; AS-DEPOSITED FILMS; C-AXIS ORIENTATIONS; DOPED ZNO; FILM RESISTIVITY; GLASS SUBSTRATES; HEXAGONAL WURTZITE STRUCTURE; HYDROGEN ANNEALING; OPTICAL TRANSMITTANCE; OPTIMAL ANNEALING; OXYGEN SPECIES; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; TI-DOPED ZNO (TZO); TIO; TRANSPARENT CONDUCTIVE OXIDES; VISIBLE-WAVELENGTH RANGE;
EID: 79953210336     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.11.110     Document Type: Conference Paper
Times cited : (47)
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