Study on the structural, electrical, and optical properties of aluminum-doped zinc oxide films by direct current pulse reactive magnetron sputtering

Thin Solid Films

Volumn 517, Issue 16, 2009, Pages 4684-4688

  Xiao Yong, Gao ^a   Qing Geng, Lin ^a   Hong Liang, Feng ^a   Yu Fen, Liu ^a   Jing Xiao, Lu ^a  

^a ZHENGZHOU UNIVERSITY   (China)

Author keywords

AZO thin films; Burstein Moss effect; Direct current pulse reactive magnetron sputtering; Optical absorption edge

Indexed keywords

ALUMINUM-DOPED ZINC OXIDES; AZO FILMS; AZO THIN FILMS; BURSTEIN-MOSS EFFECT; CRYSTALLINE STRUCTURES; DIFFRACTION PEAKS; DIRECT CURRENT PULSE REACTIVE MAGNETRON SPUTTERING; FILM RESISTIVITIES; FOUR-POINT PROBE MEASUREMENTS; FREE-CARRIER CONCENTRATIONS; GLASS SUBSTRATES; GROWTH MODES; INTEGRATED INTENSITIES; LATERAL GROWTHS; LOW RESISTIVITIES; OPTICAL ABSORPTION EDGE; OPTICAL TRANSMISSIVITY; POLYCRYSTALLINE ALUMINUMS; PREFERENTIAL ORIENTATIONS; RED SHIFTS; SUBSTRATE TEMPERATURES; VERTICAL GROWTHS; VISIBLE LIGHT REGIONS; X-RAY DIFFRACTOMETRY;

ABSORPTION; ALUMINA; ALUMINUM; CARRIER CONCENTRATION; DIFFRACTION; LIGHT; LIGHT ABSORPTION; MAGNETRON SPUTTERING; MAGNETRONS; MEASUREMENTS; OPTICAL PROPERTIES; OXIDE FILMS; SUBSTRATES; THIN FILMS; ZINC; ZINC OXIDE;

OPTICAL FILMS;

EID: 65149092122     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.133     Document Type: Article

References (20)

1. Hüpkes J., Rech B., Kluth O., Repmann T., Zwaygardt B., Müller J., Drese R., and Wuttig M. Sol. Energy Mater. Sol. Cells 90 (2006) 3054
2. Gu Y., Kuskovsky I.L., Yin M., Obrien S., and Neumark G.F. Appl. Phys. Lett. 85 (2004) 3833
3. Gupta A., and Compaan A.D. Appl. Phys. Lett. 85 (2004) 684
4. Lee J., Lee D., Lim D., and Yang K. Thin Solid Films 515 (2007) 6094
5. Agura H., Suzuki A., Matsushita T., Aoki T., and Okuda M. Thin Solid Films 445 (2003) 263
6. Zhong B., fang G.J., Wang J.F., Guan W.J., and Zhao X.Z. J. Appl. Phys. 101 (2007) 033713
7. Kim K.H., Park K.C., and Ma D.Y. J. Appl. Phys. 81 (1997) 7764
8. Hong R.J., and Jiang X. Appl. Phys., A 84 (2006) 161
9. Szyszka B. Thin Solid Films 351 (1999) 164
10. Zhitomirsky V.N., Cetinörgü E., Adler E., Rosenberg Y., Boxman R.L., and Goldsmith S. Thin Solid Films 515 (2006) 885
11. Li W., Sun Y., Wang Y.X., Cai H.K., Liu F.F., and He Q. Sol. Energy Mater. Sol. Cells 91 (2007) 659
12. Ma Q.B., Ye Z.Z., Zhu H.P., Wang J.R., and Zhao B.H. Mater. Lett. 61 (2007) 2460
13. Wang M.S., Lee K.E., Hahn S.H., Kim E.J., kim S.W., Chung J.S., Shin E.W., and Park C. Mater. Lett. 61 (2007) 1118
14. Sanon G., Rip R., and Mansingh A. Thin Solid Films 190 (1990) 287
15. Guillén C., and Herrero J. Thin Solid Films 515 (2006) 640
16. Fang Z.B., Yan Z.J., and Tan Y.S. Appl. Surf. Sci. 241 (2005) 303
17. Tominaga K., Murayama T., Umezu N., Mori I., Ushiyo T., Moriga T., and Nakabayash I. Thin Solid Films 343-344 (1999) 160
18. Burstein E. Phys. Rev. 93 (1954) 632
19. Kim K.H., Park K.C., and Ma D.Y. J. Appl. Phys. 81 (1997) 7764
20. Tan I., Shan D.L., Mirin R., Jayaraman V., Yasuda T., Hu E., and Bowers J. Appl. Phys. Lett. 59 (1991) 1875