Charge transport through thin amorphous titanium and tantalum oxide layers

Journal of the Electrochemical Society

Volumn 158, Issue 5, 2011, Pages

  Stella, Kevin ^a   Kovacs, Domocos A ^a   Diesing, Detlef ^a   Brezna, Wolfgang ^b   Smoliner, Jürgen ^b  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAPS; CHARGE TRANSPORT; CURRENT TRANSIENTS; CURRENT TRANSPORT; ENERGY RANGES; FIELD INDUCED; HETEROSYSTEMS; IN-FIELD; INTERNAL BARRIERS; INTERNAL PHOTOEMISSION; PHOTON ENERGY; TIME CONSTANTS; TUNNEL BARRIER; VOLTAGE STEP;

POWER QUALITY; TANTALUM; TANTALUM OXIDES; TITANIUM; TRANSIENTS;

TITANIUM OXIDES;

EID: 79953202523     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3566194     Document Type: Article

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