Electronic structure and chemical characterization of ultrathin insulating films

Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 209-214

  Sanz, J M ^a   Soriano, L ^a   Prieto, P ^a   Tyuliev, G ^b   Morant, C ^a   Elizalde, E ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^b INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

Author keywords

Interfaces; Ion implantation; Nickel oxide; Photoelectron spectroscopy; Titanium oxide; X ray absorption spectroscopy; Zirconium nitride

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; ION IMPLANTATION; NICKEL COMPOUNDS; PHASE TRANSITIONS; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; TITANIUM DIOXIDE; ULTRATHIN FILMS; X RAY SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

METAL-INSULATOR PHASE TRANSITION;

ELECTRIC INSULATING COATINGS;

EID: 0032476322     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01058-X     Document Type: Article

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