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Volumn 26, Issue 1, 2011, Pages 28-31

Effects of sputtering pressure on properties of copper oxide thin films prepared by rf magnetron sputtering

Author keywords

Copper oxide; Rf magnetron sputtering; Sputtering pressure; Thin films

Indexed keywords

AFM; COPPER OXIDE THIN FILMS; CUPROUS OXIDE; FOUR-POINT PROBE MEASUREMENTS; GLASS SUBSTRATES; OPTICAL AND ELECTRICAL PROPERTIES; PROCESS PARAMETERS; RF MAGNETRON SPUTTERING; SEM; SEMICONDUCTING MATERIALS; SINGLE PHASE; SPUTTERING PRESSURE; SPUTTERING PRESSURES; XRD;

EID: 79953200497     PISSN: 10667857     EISSN: None     Source Type: Journal    
DOI: 10.1179/175355511X12941605982226     Document Type: Article
Times cited : (12)

References (33)
  • 8
    • 0032694751 scopus 로고    scopus 로고
    • Z. Hiroi: Micron, 1999, 30, 491-506.
    • (1999) Micron , vol.30 , pp. 491-506
    • Hiroi, Z.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.