Deposition of thin films of different oxides of copper by RF reactive sputtering and their characterization

Vacuum

Volumn 57, Issue 4, 2000, Pages 377-385

  Ghosh, S ^a   Avasthi, D K ^a   Shah, P ^b   Ganesan, V ^b   Gupta, A ^b   Sarangi, D ^c   Bhattacharya, R ^c   Assmann, W ^d  

^a INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

^c NATIONAL PHYSICAL LABORATORY   (India)

^d UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER OXIDES; HEAVY IONS; ION BEAMS; LIGHT ABSORPTION; STOICHIOMETRY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ELASTIC RECOIL DETECTION ANALYSIS; GRAZING ANGLE X-RAY DIFFRACTION (GAXRD); REACTIVE SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0033704737     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00151-2     Document Type: Article

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