Opto-electronic properties of sputter-deposited Cu2O films treated with rapid thermal annealing

Thin Solid Films

Volumn 516, Issue 16, 2008, Pages 5449-5453

  Hsieh, J H ^a   Kuo, P W ^a   Peng, K C ^a   Liu, S J ^a   Hsueh, J D ^b   Chang, S C ^b  

^a MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Cuprous oxide; Opto electronic properties; Rapid thermal annealing

Indexed keywords

COPPER OXIDES; HALL MOBILITY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; RAPID THERMAL ANNEALING; SPUTTER DEPOSITION;

ARGON ATMOSPHERE; CUPROUS OXIDES; HALL MEASUREMENTS; OPTOELECTRONIC PROPERTIES;

THIN FILMS;

EID: 43949131407     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.097     Document Type: Article

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