The influence of rf power and oxygen flow rate during deposition on the optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 38, Issue 2, 2005, Pages 266-271

  Ogwu, A A ^a   Bouquerel, E ^a,b   Ademosu, O ^a   Moh, S ^a   Crossan, E ^a   Placido, F ^a  

^a UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

^b QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER OXIDES; FABRICATION; MAGNETRON SPUTTERING; OXYGEN; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CUPROUS OXIDE; OPTICAL BANDGAP; OXYGEN FLOW; RF POWER;

OPACITY;

EID: 12844273585     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/2/011     Document Type: Conference Paper

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