Growth and characterization of electro-deposited Cu2O and Cu thin films by amperometric i -T method on ITO/glass substrate

Applied Physics A: Materials Science and Processing

Volumn 87, Issue 1, 2007, Pages 129-135

  Shang, W ^a   Shi, X ^a   Zhang, X ^a   Ma, C ^a   Wang, C ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER; COPPER COMPOUNDS; CYCLIC VOLTAMMETRY; ELECTROLYTES; FILM GROWTH; GLASS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

BUFFER ELECTROLYTES; INDIUM TIN OXIDE (ITO); MORPHOLOGICAL PROPERTIES; REDOX COUPLES;

THIN FILMS;

EID: 33847221160     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-006-3856-x     Document Type: Article

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