TEM characterisation of GdN thin films

Current Applied Physics

Volumn 6, Issue 3, 2006, Pages 407-410

  McKenzie, W R ^a   Munroe, P R ^a   Budde, F ^b   Ruck, B J ^b   Granville, S ^b   Trodahl, H J ^b  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b VICTORIA UNIVERSITY OF WELLINGTON   (New Zealand)

Author keywords

FIB; Gadolinium nitride; GdN; TEM; Thin film

Indexed keywords

ELECTRONIC STRUCTURE; NITROGEN; QUARTZ APPLICATIONS; RARE EARTH ELEMENTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FIB; GADOLINIUM NITRIDE; GDN; ROOM TEMPERATURE;

GADOLINIUM COMPOUNDS;

EID: 33744509824     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2005.11.029     Document Type: Article

References (2)

1. Aerts C.M., Strange P., Horne M., Temmerman W.M., Szotek Z., and Svane A. Phys. Rev. B 69 (2004) 045115
2. Giannuzzi L.A., and Stevie F.A. Micron 30 (1999) 197