Fatigue insensitivity of nanoscale freestanding aluminum films

Journal of Microelectromechanical Systems

Volumn 20, Issue 1, 2011, Pages 53-58

  Kumar, Sandeep ^a   Alam, Md Tarekul ^a   Haque, M A ^a  

^a The Pennsylvania State University   (United States)

Author keywords

Electron microscopy; fatigue; microelectromechanical devices; thin films

Indexed keywords

ALUMINUM FILM; CONVENTIONAL THEORY; FATIGUE; FATIGUE-CRACK NUCLEATION; IN-SITU; MICROELECTROMECHANICAL SYSTEMS; NANO SCALE; NANOSCALE FREESTANDING THIN FILMS; NOMINAL STRESS; SLIP BAND; TRANSMISSION ELECTRON MICROSCOPE; ULTIMATE STRENGTH;

ALUMINUM; CRACKS; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FATIGUE DAMAGE;

EID: 79551596191     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2010.2100033     Document Type: Article

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