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Volumn 157, Issue 2, 2010, Pages

Deposition processes in the metallorganic chemical vapor deposition of CeO2 films

(10) Suda, M a Ogawa, M a Otsuka, K a Nakamura, K a Izu, T a Morita, T a Suzuki, S b Ishibashi, K c Nakamura, M c Yamamoto, Y a

a HOSEI UNIVERSITY (Japan)

b Comet Incorporated ^* (Japan)

c Canon ANELVA Corporation ^* (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEHYDRATION REACTIONS; DEPOSITION PROCESS; DIFFERENT MASS; ELECTRON IMPACT; ION ATTACHMENT; SIMPLE REACTION; SOURCE MATERIAL; SPECTROMETRIC TECHNIQUES; SUBSTRATE SURFACE; SURFACE SITES; TETRAKIS;

ACTIVATION ENERGY; CERIUM; CERIUM COMPOUNDS; DEHYDRATION; DESORPTION; IMPACT IONIZATION; ORGANOMETALLICS;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 73849132839 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3270470 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.