Deposition of cerium oxide films on Si (1 0 0) and glass substrates using the ESAVD method

Journal of Crystal Growth

Volumn 284, Issue 3-4, 2005, Pages 464-469

  Wei, Ming ^a,b   Choy, K L ^a,c  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

A1. X ray diffraction; A3. Electrostatic spray assisted vapor deposition; A3. Vapor phase epitaxy; B1. Oxide; B2. Dielectric materials

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC MATERIALS; ELECTROSTATICS; GLASS; HIGH RESOLUTION ELECTRON MICROSCOPY; OXIDES; SILICON; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; VAPOR PHASE EPITAXY; X RAY DIFFRACTION;

DC VOLTAGE; ELECTROSTATIC SPRAY-ASSISTED VAPOR DEPOSITION (ESAVD); FUNCTIONAL OXIDE FILMS;

CERIUM COMPOUNDS;

EID: 26044458187     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.07.034     Document Type: Article

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