Pure and doped CeO2 thin films prepared by MOCVD process

Thin Solid Films

Volumn 324, Issue 1-2, 1998, Pages 89-93

  Pan, M ^a   Meng, G Y ^a   Xin, H W ^a   Chen, C S ^a   Peng, D K ^a   Lin, Y S ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b University of Cincinnati   (United States)

Author keywords

Cerium; Organometallic vapor deposition; Oxides; Yttrium

Indexed keywords

CRYSTAL STRUCTURE; FILM PREPARATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; POROUS MATERIALS; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

CERIUM OXIDE; SCHERRER EQUATIONS;

CERIUM COMPOUNDS;

EID: 0032122164     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01215-7     Document Type: Article

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