SCOPUS 정보 검색 플랫폼

Volumn 244, Issue 1-4, 2005, Pages 244-247

Influence of reacting nitrogen gas consistence on the properties of TiN films prepared by rf. magnetron sputtering

Author keywords

Microstructure; rf. Magnetron sputtering; Surface energy; TiN; Ttribology

Indexed keywords

FRICTION; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; MICROSTRUCTURE; NITROGEN; PRESSURE EFFECTS; STEEL; SUBSTRATES; THIN FILMS; TRIBOLOGY;

DEPOSITED FILMS; FRICTIONAL COEFFICIENT; REACTIVE GAS MIXTURES; WORKING GAS;

TITANIUM NITRIDE;

EID: 15844429777 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2004.09.173 Document Type: Conference Paper

Times cited : (24)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.