Optical and chemical characterization of thin TiNx films deposited by DC-magnetron sputtering

Vacuum

Volumn 82, Issue 10, 2008, Pages 1115-1119

  Wrehde, Stefan ^a   Quaas, Marion ^a   Bogdanowicz, Robert ^b   Steffen, Hartmut ^c   Wulff, Harm ^a   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b GDANSK UNIVERSITY OF TECHNOLOGY   (Poland)

^c Inst of Low Temp Plasma Physics   (Germany)

Author keywords

DC magnetron sputtering; Electron resolved mass spectroscopy; Spectroscopic ellipsometry; Titanium nitride; X ray surface analysis

Indexed keywords

MAGNETRON SPUTTERING; SPECTROSCOPIC ELLIPSOMETRY; SYNTHESIS (CHEMICAL); TITANIUM NITRIDE;

DC-MAGNETRON SPUTTERING; ELECTRON RESOLVED MASS SPECTROSCOPY; X-RAY SURFACE ANALYSIS;

THIN FILMS;

EID: 43449123615     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.01.028     Document Type: Article

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