Characteristics of the Ti2N layer produced by an ion assisted deposition method

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 698-703

  Ruset, C ^a   Grigore, E ^a   Collins, G A ^b   Short, K T ^b   Rossi, F ^c   Gibson, N ^c   Dong, H ^d   Bell, T ^d  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^c JOINT RESEARCH CENTRE   (Italy)

^d UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

Instrumented indentation; Ion implantation; Magnetron sputtering; Stress analysis; Wear

Indexed keywords

ELECTRIC DISCHARGES; INDENTATION; ION BOMBARDMENT; ION IMPLANTATION; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; TRIBOLOGY; X RAY DIFFRACTION ANALYSIS;

VOLTAGE DISCHARGES;

ION BEAM ASSISTED DEPOSITION;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144440085     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00411-0     Document Type: Article

References (4)

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2. Ruset C. Grigore E. Surf. Coat. Technol. 156 2002 159-161
3. Bilek M.M.M. et al. Surf. Coat. Technol. 156 2002 136-142
4. Veprek S. J. Vac. Sci. Technol. A 17 5 1999 2401-2420