Experimental observation of local heteroepitaxy between cubic-C3N4 and Ti2N in CNx/TiNy bilayers prepared by ion beam sputtering

Journal of Crystal Growth

Volumn 225, Issue 1, 2001, Pages 67-72

  Tian, Y J ^a   Yu, D L ^a   He, J L ^a   Xiao, F R ^a   Wang, T S ^a   Li, D C ^a   Li, L ^b   Zheng, G ^c   Yanagisawa, O ^d  

^a YANSHAN UNIVERSITY   (China)

^b INSTITUTE OF PHYSICS   (China)

^c Institute of Hui Guang Technology   (China)

^d HIROSHIMA UNIVERSITY   (Japan)

Author keywords

A1. Characterization; A1. Crystal structure; A1. Nucleation; A3. Physical vapor deposition processess; A3. Slid phase epitaxy; B1. Nitrides

Indexed keywords

CARBON NITRIDE; CRYSTAL DEFECTS; CRYSTAL LATTICES; CRYSTAL ORIENTATION; ELECTRON DIFFRACTION; NUCLEATION; PHYSICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

ION BEAM SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0035338899     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01011-9     Document Type: Article

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