Effects of hydrogen in working gas on valence states of oxygen in sputter-deposited indium tin oxide thin films

ACS Applied Materials and Interfaces

Volumn 2, Issue 3, 2010, Pages 663-668

  Luo, Suning ^a,b   Kohiki, Shigemi ^a   Okada, Koichi ^a   Kohno, Atsushi ^c   Tajiri, Takayuki ^c   Arai, Masao ^d   Ishii, Satoshi ^e   Sekiba, Daiichiro ^e   Mitome, Masanori ^d   Shoji, Fumiya ^f  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^b LIAONING UNIVERSITY OF TECHNOLOGY   (China)

^c FUKUOKA UNIVERSITY   (Japan)

^d NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^e UNIVERSITY OF TSUKUBA   (Japan)

^f KYUSHU KYORITSU UNIVERSITY   (Japan)

Author keywords

Hydrogen incorporation; ITO thin film; Rutherford backscattering spectroscopy elastic recoil detection analysis; Sputter deposition; X ray photoelectron spectroscopy

Indexed keywords

AS-DEPOSITED FILMS; BAND STRUCTURE CALCULATION; CARRIER DOPING; CONCENTRATION OF; ELASTIC RECOIL DETECTION ANALYSIS; FIRST-PRINCIPLES; HIGH DENSITY; HYDROGEN INCORPORATION; INDIUM TIN OXIDE FILMS; INDIUM TIN OXIDE THIN FILMS; ITO THIN FILM; ITO THIN FILMS; LOW MOBILITY; PLASMA SPUTTER DEPOSITION; SCATTERING CENTERS; VALENCE STATE; WORKING GAS; XPS;

BACKSCATTERING; BAND STRUCTURE; DEPOSITION; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; HYDROGEN; INDIUM; IONIZATION OF GASES; ITO GLASS; OXIDE FILMS; OXYGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTOLITHOGRAPHY; PHOTONS; PLASMA DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPECTRUM ANALYSIS; THIN FILMS; TIN; TITANIUM COMPOUNDS; X RAY ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79151482054     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am9006676     Document Type: Article

References (31)

1. Salehi, A. Thin Solid Films 1998, 324, 214
2. Sheu, J. K., Su, Y. K., Chi, G. C., Jou, M. J. and Chang, C. M. Appl. Phys. Lett. 1998, 72, 3317
3. Lewis, B. and Paine, D. MRS Bull. 2000, 25, 22
4. Ginley, D. and Bright, C. MRS Bull. 2000, 25, 15
5. Granqvist, C. G. and Hultaker, A. Thin Solid Films 2002, 411, 1
6. Lany, S. and Zunger, A. Phys. Rev. Lett. 2007, 98 045501
7. Shigesato, Y., Koshi-ishi, R., Kawashima, T. and Ohsako, J. Vacuum 2000, 59, 614
8. Jun, S.-I., McKnight, T. E., Simpson, M. L. and Rack, P. D. Thin Solid Films 2005, 476, 59
9. Dewit, J. H. W. J. Solid State Chem. 1973, 8, 142
10. Dewit, J. H. W., Vanunen, G. and Lahey, M. J. Phys. Chem. Solids 1977, 38, 819
11. Morikawa, H. and Fujita, M. Thin Solid Films 2000, 359, 61
12. Koida, T., Fujiwara, H. and Kondo, M. Jpn. J. Appl. Phys 2007, 46, L685
13. King, P. D. C., Lichti, R. L., Celebi, Y. G., Gil, J. M., Vil'o, R. C., Alberto, H. V., Duarte, J. P., Payne, D. J., Egdell, R. G., McKenzie, I., McConville, C. F., Cox, S. F. J. and Veal, T. D. Phys. Rev. B 2009, 80 081201(R)
14. Limpijumnong, S., Reunchan, P., Janotti, A. and Van De Walle, C. G. Phys. Rev. B 2009, 80, 193202
15. Luo, S., Okada, K., Kohiki, S., Tsutsui, F., Shimooka, H. and Shoji, F. Mater. Lett. 2009, 63, 641
16. Wallinga, J., Bik, W. M. A., Vredenberg, A. M., Schropp, R. E. I. and van der Weg, W. F. J. Phys. Chem. B 1998, 102, 6219
17. Blaha, P., Schwartz, K., Madsen, G. K. H., Kvasnicka, D. and Luitz, J. WIEN2k, An Augmented Plane Wave + Local Orbitals Program for Calculating Crystal Properties; Tech. Universitat Wien: Vienna, Austria, 2001.
18. Marezio, M. Acta Crystallogr. 1966, 20, 723
19. Zhang, D. H. and Ma, H. L. Appl. Phys. A: Mater. Sci. Process. 1996, 62, 487
20. Chen, M., Pei, Z. L., Wang, X., Yu, Y. H., Liu, X. H., Sun, C. and Wen, L. S. J. Phys. D: Appl. Phys. 2000, 33, 2538
21. Chen, M., Pei, Z., Wang, X., Sun, C. and Wen, L. Mater. Res. Soc. Symp. Proc. 2001, 666, F2.3/1.
22. Minami, T., Suzuki, S. and Miyata, T. Mater. Res. Soc. Symp. Proc. 2001, 666, F1.3/1.
23. Gilmore, A. S., Al-Kaoud, A., Kaydanov, V. and Ohno, T. R. Mater. Res. Soc. Symp. Proc. 2001, 666, F3.10/11.
24. Ishibashi, S., Higuchi, Y., Ota, Y. and Nakamura, K. J. Vac. Sci. Technol., A 1990, 8, 1399
25. Banerjee, R., Ray, S., Basu, N., Batabyal, A. K. and Barua, A. K. J. Appl. Phys. 1987, 62, 912
26. Wu, X. C., Hong, J. M., Han, Z. J. and Tao, Y. R. Chem. Phys. Lett. 2003, 373, 28
27. Sasaki, M., Kiyoshima, R., Kohiki, S., Matsushima, S., Oku, M. and Shisido, T. J. Alloys Compd. 2001, 322, 220
28. Sasaki, M., Yasui, K., Kohiki, S., Deguchi, H., Matsushima, S., Oku, M. and Shisido, T. J. Alloys Compd. 2002, 334, 205
29. Lee, M.-S., Choi, W. C., Kim, E. K., Kim, C. K. and Min, S.-K. Thin Solid Films 1996, 279, 1
30. Fan, J. C. C. and Goodenough, J. B. J. Appl. Phys. 1977, 48, 3524
31. Yeh, J. J. and Lindau, I. At. Data Nucl. Data Tables 1985, 32, 1